Free press releases distribution network?

Agency / Source: Imec

Check Ads Availability|e-mail Article


Are you the owner of this article?, Turn it PREMIUM with your LOGO instead - and make it 3rd party Ads-Free! within the next hour!



Imec Reports Breakthrough Results on Directed Self-Assembly at SPIE Advanced Lithography 2015 - Developments Pave the Way to DSA Extending 193nm Immersion Lithography Towards the 7nm Node - DSASymposium.org / imec.be
Imec Reports Breakthrough Results on Directed Self-Assembly at SPIE Advanced Lithography 2015

 

PRZOOM - /newswire/ - Leuven, Belgium, 2015/02/19 - Developments Pave the Way to DSA Extending 193nm Immersion Lithography Towards the 7nm Node - DSASymposium.org / imec.be.

   
 
Your Banner Ad Here instead - Showing along with ALL Articles covering Electronics/Instrumentation/RFID Announcements

Replace these Affiliate Programs at ANYTIME! Your banner here within the next hour. Learn How!


 

At next week’s SPIE advanced lithography conference, to be held in San Jose, Calif., Feb. 22-26, imec will present breakthrough results on Directed Self-Assembly (DSA) process development. Together with semiconductor equipment supplier Tokyo Electron and Merck, a leading chemical and pharmaceutical company that acquired AZ Electronic Materials in May 2014, imec has significantly improved DSA defectivity in the past year, approaching single-digit values.

Additionally, the partners have developed a DSA solution for a via patterning process compatible with the 7nm technology node. Furthermore, imec has developed a new chemo-epitaxy flow for 30nm and 45nm pitch hexagonal holes patterning using a single 193nm immersion exposure, envisioning DSA patterning for the storage-node for DRAM applications.

Reducing defectivity in DSA and improving patterning reliability is one of the main roadblocks to creating an industrially-viable DSA patterning process to push 193nm immersion litho beyond its current limits. Imec and its partners, Merck and Tokyo Electron, have made significant progress on this aspect, achieving best-in-class defectivity values of 24 defects/cm2.

“Over the past few years, we have realized a reduction of DSA defectivity by a factor 10 every six months,” stated An Steegen, senior vice president of process technologies at imec. “Together, with Merck and Tokyo Electron, providing state-of-the-art DSA materials and processing equipment, we are looking ahead at two different promising DSA processes that will further improve defectivity values in the coming months. Our processes show the potential to achieve single-digit defectivity values in the near future without any technical roadblocks lying ahead.”

Imec, Merck and Tokyo Electron also achieved breakthroughs in two other barriers in the development of DSA patterning solutions. First, decomposition of an N7 compatible via layer was achieved. This required a novel templated DSA process with polystyrene (PS)-wetting sidewalls of the template pre-pattern. This process allows to significantly reduce the critical dimension (CD) of the template, in comparison to using the conventional a polymethylmetacrylate (PMMA)-wetting scheme. Second, an etch process has been developed to transfer the small vias (~15nm CD) into the underlying hard mask with excellent open hole rate.

Furthermore, imec has developed a new chemo-epitaxy flow for patterning of highly dense 45nm pitch hexagonal hole arrays. The process paves the way to single patterning 193nm immersion lithography in DRAM applications. Cost is crucial in standalone memory, and DRAM scaling will heavily rely on advanced patterning techniques enabling ≤ 45nm storage node pitch with a minimal number of steps for D14 and beyond.

“In today’s consolidating semiconductor landscape, equipment and material suppliers are playing a key role in tackling the scaling challenges and accelerating technology advancements. Our progress on DSA process development is a testament to this, and the result of a deeply concentrated collaboration with Tokyo Electron and Merck, providing the advanced process tooling and materials knowledge paramount to achieve these breakthroughs.” added Steegen. “As an answer to the evolutions in the industry, we are setting up a supplier hub, aiming to offer a neutral, open innovation R&D platform that closely involves suppliers at an early process step and module development stage and allows for efficient cost sharing, minimized risk and optimized return on investment for all in the semiconductor ecosystem. Following recent announcements concerning imec’s equipment supplier hub, which has already resulted in research acceleration, we are now increasing our efforts to build a material supplier hub, which will be a focus in 2015.”

On October 26-27, 2015, imec will organize, in collaboration with SEMATECH, EIDEC and CEA-Leti, the 1st International Symposium on DSA. The aim of the symposium is to identify key remaining challenges for insertion of DSA into semiconductor manufacturing and to identify potential solutions. More information dsasymposium.org/.

About imec
Imec (imec.be) performs world-leading research in nanoelectronics and photovoltaics. Imec leverages its scientific knowledge with the innovative power of its global partnerships in ICT, healthcare and energy. Imec delivers industry-relevant technology solutions. In a unique high-tech environment, its international top talent is committed to providing the building blocks for a better life in a sustainable society. Imec is headquartered in Leuven, Belgium, and has offices in the Netherlands, Taiwan, US, China, India and Japan. Its staff of over 2,080 people includes more than 670 industrial residents and guest researchers. In 2013, imec’s revenue (P&L) totaled 332 million euro.

Imec is a registered trademark for the activities of IMEC International (a legal entity set up under Belgian law as a “stichting van openbaar nut”), imec Belgium (IMEC vzw supported by the Flemish Government), imec the Netherlands (Stichting IMEC Nederland, part of Holst Centre which is supported by the Dutch Government), imec Taiwan (IMEC Taiwan Co.) and imec China (IMEC Microelectronics (Shanghai) Co. Ltd.) and imec India (Imec India Private Limited).

 
 
Your Banner Ad Here instead - Showing along with ALL Articles covering Electronics/Instrumentation/RFID Announcements

Replace these Affiliate Programs at ANYTIME! Your banner here within the next hour. Learn How!


 

Agency / Source: Imec

 
 

Availability: All Regions (Including Int'l)

 

Traffic Booster: [/] Quick PRZOOM - Press & Newswire Visibility Checker

 

Distribution / Indexing: [+] / [Company listed above is a registered member of our network. Content made possible by PRZOOM / PRTODAY indexing services]

 
 
# # #
 
 
  Your Banner Ad showing on ALL
Electronics/Instrumentation/RFID articles,
CATCH Visitors via Your Competitors Announcements!


Imec Reports Breakthrough Results on Directed Self-Assembly at SPIE Advanced Lithography 2015

Company website links NOT available to basic submissions
It is OK to republish and/or LINK any newswire for any legitimate media purpose as long as you name PRZOOM - Press & Newswire and LINK as the source.
 
  For more information, please visit:
Is this your article? Activate ALL web links by Upgrading to Press Release PREMIUM Plan Now!
Imec | SPIE Advanced Lithograph
Contact: Hanne Degans - imec.be 
+32 16 28 17 69 / +32 486 06 51 75 (mobile) hanne.degans[.]imec.be
 
PRZOOM / PRTODAY - Newswire Today disclaims any content contained in this article. If you need/wish to contact the company who published the current release, you will need to contact them - NOT us. Issuers of articles are solely responsible for the accuracy of their content. Our complete disclaimer appears here.
IMPORTANT INFORMATION: Issuance, publication or distribution of this press release in certain jurisdictions could be subject to restrictions. The recipient of this press release is responsible for using this press release and the information herein in accordance with the applicable rules and regulations in the particular jurisdiction. This press release does not constitute an offer or an offering to acquire or subscribe for any Imec securities in any jurisdiction including any other companies listed or named in this release.

Electronics/Instrumentation/RFID via RSSAdd NewswireToday - PRZOOM Headline News to FeedBurner
Find who RetweetFollow @NewswireTODAY



Are you the owner of this article?, Turn it PREMIUM with your LOGO instead - and make it 3rd party Ads-Free! within the next hour!




Read Latest Press Releases From Imec / Company Profile


Read Electronics/Instrumentation/RFID Most Recent Related Press Releases:

Frost & Sullivan Commends Keysight's Growth in Calibration and Repair Services from its New Customer-centric Solutions
Imec Develops 3D-Compatible Germanium nMOS Gate stack with High Mobility and Superior Reliability
Curtiss-Wright to Expand Position in Data Acquisition & FTI Markets with Acquisition of Teletronics Technology Corporation
Datalogic Receives Top Honor At Inspect Awards 2017
Leonardo Sees Surge in Export Orders for Man-portable Laser Designators from US and Europe
Imec Demonstrates World’s First Vertically Stacked Gate-all-Around Si Nanowire CMOS Transistors
GE Ventures, Microsemi and Corning Partner to Launch Menlo Micro and Next Generation of Electronic Switching
Frost & Sullivan Commends LeEco for Driving Innovation in the North American Smart Technologies Market
Malvern Instruments and PANalytical to Merge
Bruker Announces Corporate Partnership with International Phenome Centre Network (IPCN) for NMR Technologies and SOPs

Boost Your Social Network
& Crowdfunding Campaigns


LIFETIME SOCIAL MEDIA WALL
 
NewswireToday Celebrates 10 Years in Business
Find business coaching, life coaching, executive coaching and corporate coaching, best selling coaching books, ...



PREMIUM Members


Visit  BizJobs.com

Visit  Triggr & Bloom

Visit  La Bella Bakery Artisan Bakery Arizona







 
  ©2016 PRZOOM — Limelon Advertising, Co.
Home | About PRZOOM | Advertise/Pricing | Contact | Investors | Privacy/TOS | Sitemap | FRANCAIS
newswire, PR free press releases distribution service magazines engine news alert newsroom press room breaking news public relations articles company news alerts newswiredistribution ezine bizentrepreneur biznewstoday digital business report market search pr firms agencies reports distri-bution today investor relation successful internet entrepreneur newswire distribution prtoday.com freenewswiredistribution asianewstoday bizwiretoday USA pr UK today