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Mentor Graphics’ Calibre SmartFill Addresses TSMC 20nm Fill Requirements - Mentor Graphics Corporation (NASDAQ: MENT) today announced TSMC will use the Calibre® SmartFill solution to achieve TSMC’s fill requirements for its 20nm manufacturing processes - Mentor.com
Mentor Graphics’ Calibre SmartFill Addresses TSMC 20nm Fill Requirements

 

PRZOOM - /newswire/ - Wilsonville, OR, United States, 2012/05/30 - Mentor Graphics Corporation (NASDAQ: MENT) today announced TSMC will use the Calibre® SmartFill solution to achieve TSMC’s fill requirements for its 20nm manufacturing processes - Mentor.com. NASDAQ: MENT

   
 
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SmartFill analysis and automatic filling capabilities in the Calibre YieldEnhancer product address new 20nm fill requirements that cannot be achieved with traditional dummy fill approaches. The Calibre SmartFill solution delivers smaller post-fill GDS database size and faster runtimes, allowing designers to meet IC fill constraints in a single pass without manual customization or modification, and with minimal impact on circuit performance.

New Capabilities for Advanced Fill Requirements
The move to more advanced nodes has pushed fill requirements beyond traditional fill approaches. In addition to improving planarity, fill now needs to handle CMP-ECD, etch, lithography, stress and rapid thermal annealing (RTA). A more advanced solution must deal with those effects concurrently and still provide ease of use and design flow integration.

The SmartFill capability in the Calibre YieldEnhancer product provides advanced capabilities such as multi-layer fill shapes and user-defined fill cells that are automatically inserted into a layout based on analysis of the design. It also supports continuous, multi-dimensional functions in place of linear pass-fail conditions, enabling finer resolution of complex fill algorithms that cannot be performed with single-dimensional design rules alone. This allows customers to simultaneously optimize for multiple factors such as density and perimeter.

The SmartFill solution fits into the customer’s existing design environment with back annotation of fill shapes into all leading design databases to support final timing verification. It also allows customers to define a list of critical nets that require special treatment during the fill procedure.

“Adding fill to advanced IC layouts is about much more than just controlling planarity in manufacturing,” said Jean-Marie Brunet, director product marketing for Calibre DFM and Place-and-Route Integration at Mentor Graphics. “Calibre SmartFill gives designers a fast and automated solution that creates the precise amount, shape and location of fill, not only to ensure that layouts meet complex manufacturing requirements, but also to maintain design intent.”

“We continue to work with Mentor to meet new fill challenges as we move to each successive process node,” said Suk Lee, TSMC senior director, Design Infrastructure Marketing Division. “At 20nm an effective fill strategy is important for successful manufacturing. Calibre’s integrated fill analysis and cell-based approach makes fill more precise and makes writing fill decks easier, while achieving target runtime and output file size.”

About Mentor Graphics

Mentor Graphics Corporation (mentor.com) is a world leader in electronic hardware and software design solutions, providing products, consulting services and award-winning support for the world’s most successful electronic, semiconductor and systems companies. Established in 1981, the company reported revenues in the last fiscal year of about $1,015 million. Corporate headquarters are located at 8005 S.W. Boeckman Road, Wilsonville, Oregon 97070-7777.

(Mentor Graphics and Calibre are registered trademarks of Mentor Graphics Corporation. All other company or product names are the registered trademarks or trademarks of their respective owners.)

 
 
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Mentor Graphics’ Calibre SmartFill Addresses TSMC 20nm Fill Requirements

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Contact: Gene Forte / Sonia Harrison - Mentor.com 
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